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We offer a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for your particular applications. A number of metallurgical techniques are employed in PVD material fabrication.
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Plasmaterials, Inc., manufactures a complete line of backing plates for almost every commercially available sputtering, cathodic arc, ion deposition and laser beam ablation system. Additionally, custom backing plates can be designed, engineered and manufactured for non-conventional or in-house designed deposition systems.
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Plasmaterials, Inc. offers electron beam starter sources for utilization in Thin Film
Deposition in both production and research applications. These pre-forms are
manufactured to geometrically fit directly into the conically shaped e-beam
hearths of all commercially available sources. These solid bulk sources save time
and money by allowing the operator the freedom to ...
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Plasmaterials, Inc. provides all metal bonding to affix sputtering targets to backing plates for systems which do not utilize a bolt-on target assembly. These targets can range from elemental metals to oxides, nitrides, carbides, fluorides, compounds, refractories, ceramics, intermetallics, etc., including any combination thereof. Backing plates are typically produced from OFE copper, non-magnetic statinless steel (316 or 304), moylybdenum or aluminum.
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