by padmin | Dec 1, 2016 | Uncategorized
In our most recent BLOG we briefly described the process of sintering ceramic type sputtering target materials via. the powder metallurgical process referred to as sintering. We further described the consolidation steps associated with this manufacturing process...
by padmin | Nov 1, 2016 | Uncategorized
A while back (January 2016) we discussed a brief but fundamental description of what the basic processes are associated with the production of elemental and metal alloy sputtering targets. At that time we promised to address the analogous process of how ceramic, or...
by padmin | Oct 1, 2016 | Uncategorized
There are many reasons for bonding a sputtering target to an associated backing plate. In essence, all of these reasons basically relate to the physical properties associated with the composition of the sputtering target under consideration and the choice of the...
by padmin | Sep 1, 2016 | Uncategorized
Back in July I talked a bit about the sputtering of metallic alloys, or composite materials, and the relationship between the starting material compositions and that of the resultant films. Here I would like to do a follow up piece and discuss an alternative method of...
by padmin | Aug 1, 2016 | Uncategorized
A good portion of our customer base here at Plasmaterials, Inc. are scientists, engineers, educators or people working in some form of research and development, be it either in academia or industrial oriented. Such customers are more often concerned with material...
