Production of Metal Alloy Sputtering Targets

There are a number of different ways to manufacture sputtering targets. Depending on the composition of the target being considered for production it is necessary to choose the proper method of consolidation that best suits the metallurgical criteria required for the...

Sputter Yield of Alloy Sputtering Targets

As most of our customers around the world are well aware, the process of sputtering involves charged particles, or ions, (gaseous molecules with an outer electron stripped off containing a positive charge) bombarding negatively charged sputtering target atoms or...

Dark Space Shields

What Are Dark Space Shields? There are a lot of reasons why there may be an arcing problem during the plasma deposition process during sputtering. During the sputtering process a gas, typically argon unless a reactive deposition is required, is transformed from a...

Arching Concerns When Sputtering SiO2

Recently a customer asked about continuously running an SiO2 Sputtering Target and specifically concerns about arcing. There is always going to be some “re-deposition” onto a sputtering target where stray molecules that have been knocked off the target...

Proper Handling of PVD Materials

How To Properly Handle PVD Materials Just a few things to mention here regarding the proper procedural handling of sputtering targets and evaporation materials. Most deposition materials are fairly robust but, depending on the specific composition or Stoichiometry,...

Preconditioning Ceramic Targets

The issue that I am trying to address here is a customer’s request for information on the proper procedure on how to precondition and operate an IGZO i.e. In2O3/Ga2O3/ZnO 1:1:1: At % sputtering target configuration with a standard (extended) Semicore Equipment,...

Arching Problems in the Plasma

“Arcing” is quite often an issue with any sputtering process and can lead to disastrous results if not properly maintained or, more preferably, eliminated. When we say “arcing” we are referring to the electrical potential applied to the...

Sputtering with Metallically Bonded Segmented Targets

At the Materials Research Society (MRS) Spring Conference in San Francisco the other day an attendee stopped by our Trade Show Booth in the Exhibition Hall at the Moscone Center where we had on display a multi piece linear target bonded to a copper backing plate and...