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Plasmaterials - Plasma Technology for the Thin Film Industry, including sputtering targets, crucible liners & evaporation materials.
Large planar magnetron sputtering target

Thin Film Industry: Powder Metallurgy, Vacuum Melting & Casting, Analytic Capability, Material Development, Advanced Engineering, Plasma Spraying, Quality Control

Powder Metallurgy Vacuum Melting and Casting Analytic Capability Material Development Advanced Engineering Plasma Spraying Quality Control

Plasmaterials, Inc. strives to be technically innovative in all forms of material fabrication. New materials and processes are constantly being developed to meet the needs of an ever-changing industry.

Powder Metallurgy

In the past several years, Plasmaterials, Inc. has developed a variety of metallurgical processes to service the product requirements of the Thin Film Industry. This technology includes hot pressing, cold isostatic pressing or "CIPing", vacuum sintering, hot isostatic pressing or "HIPing" for refractory ceramics, (oxides, nitrides, borides, sulfides, selenides, tellurides, carbides, etc.) as well as composite materials.

These technologies are often blended with other fabrication procedures to provide superior PVD products. Grain reduction, densification, purification and blending are just a few of the metallurgical processes and parameters designed into the products produced by Plasmaterials Inc.


Vacuum Melting & Casting

Plasmaterials, Inc. employs a number of different techniques to produce metal and metal alloy materials. Depending upon temperature ranges required and physical properties of the constituents; materials are either vacuum arc melted or electron-beam melted. These materials are further processed through zone refining for purification and then fabricated into the desired shape or form.


Analytic Capability

Purity and composition are constantly monitored on all materials being produced. Various testing resources include Glow Discharge Mass Spectrometry (GDMS) and Secondary Ion Mass Spectrometry (SIMS) for bulk material analysis. Additionally, surface morphology and subsurface analysis can be evaluated utilizing AUGER-ESCA and Microprobe testing. The result is that compositional integrity, as well as consistency, and homogeneity are maintained for each target or evaporation source.


Material Development

Through our technological development, all phases of material characterization can be accomplished. The properties of a metal or compound can be accurately determined through the use of qualitative and quantitative analytical techniques. This approach is especially helpful in developing new materials for specific applications or refining current materials to meet tighter quality requirements.


Advanced Engineering

Plasmaterials, Inc. has developed a large range of fabrication techniques. Materials can be formed or shaped into unique contours for enhanced designs, rotary targets, and evaporation charges, etc.


Plasma Spraying

Plasmaterials, Inc. has been innovative in developing the technology to plasma spray materials directly onto cooling plates for both planar and rotary sputtering applications.

A new generation of materials can now be supplied which previously had been impossible to fabricate. Nonequilibrium alloys, phase pure composite, amorphous materials and supersaturated solutions can be supplied on the backing plates and tubes to help create the next generation of thin film development.


Quality Control

Plasmaterials, Inc. is committed to providing the highest quality products and services while matching the changing needs and expectations of its customers.


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