Chromium Sputtering Target

CHROMIUM SPUTTERING TARGETS

Atomic Number: 24
Composition: Cr
Density: 7.19 g/cm3
Melting Point: 1907 °C

Plasmaterials, Inc. provides high purity chromium and chromium alloys for all PVD applications. Sputtering targets are produced to fit all commercially available cathode configurations as well as for custom and customer specified designs. Chromium sputtering targets may either be supplied in monolithic form or metallically bonded to backing plates as required.

Evaporation materials typical size is 3-6mm random size pieces. They can also be made to specific customer specifications.  Electron beam starter sources are available in various sizes to fit directly into the E-beam hearth or to fit within a hearth liner.

Chromium can be sputtered elementally or reactively with a partial pressure of oxygen introduced in the working gas to produce Chromium oxide thin films. Resultant films are used in a variety of applications including the automobile industry to form decorative coatings found on wheels.

Chromium is used in many vacuum applications such as automotive glass coatings, photovoltaic cell fabrication, battery fabrication, and corrosion resistant coatings.