Technology Information


Physical Vapor Deposition or PVD has become an established commercial process for manufacturing all types of thin film products. Whether through a momentum transfer of charged ions to individual atoms (sputtering) or a direct transfer of amplified light to a material target (laser ablation), a collimated source of accelerated focused ion beam bombardment directly to a material target (ion deposition) or thermal transfer (evaporation) resultant films can be deposited on selective substrates to produce products which are technologically advanced, less expensive, easier to fabricate, lighter in weight and more refined than their bulk material counterparts.

Through PVD, virtually every element, alloy, composite or refractory material can be transformed from bulk to thin film form. These processes and products span a wide range of commercial industries as well as playing a leading role in material and technology development. Plasmaterials, Inc. offers these materials in many different forms including evaporation pellets, wire, powder, electron beam starter sources or sputtering targets.

As a worldwide manufacture and marketer of specialty materials for use in the thin film industry, Plasmaterials, Inc. offers a diversified range of products that span from ceramics, metals, and elemental forms for use in R&D, pilot and full-scale production. Most materials can be fabricated in specific geometries to fit all commercially available, as well as custom designed systems. These products include ceramics, nitrides, carbides, oxides, refractories, zone refined materials, ferrous, non-ferrous and precious metals.

Plasmaterials, Inc. strives to be technically innovative in all forms of material fabrication. New materials and processes are constantly being developed to meet the needs of an ever-changing industry.

Powder Metallurgy
In the past several years, Plasmaterials, Inc. has developed a variety of metallurgical processes to service the product requirements of the Thin Film Industry. This technology includes hot pressing, cold isostatic pressing or “CIPing”, vacuum sintering, hot isostatic pressing or “HIPing” for refractory ceramics, (oxides, nitrides, borides, sulfides, selenides, tellurides, carbides, etc.) as well as composite materials.

These technologies are often blended with other fabrication procedures to provide superior PVD products. Grain reduction, densification, purification and blending are just a few of the metallurgical processes and parameters designed into the products produced by Plasmaterials Inc.

Vacuum Melting & Casting
Plasmaterials, Inc. employs a number of different techniques to produce metal and metal alloy materials. Depending upon temperature ranges required and physical properties of the constituents; materials are either vacuum arc melted or electron-beam melted. These materials are further processed through zone refining for purification and then fabricated into the desired shape or form.

Analytic Capability
Purity and composition are constantly monitored on all materials being produced. Various testing resources include Glow Discharge Mass Spectrometry (GDMS) and Secondary Ion Mass Spectrometry (SIMS) for bulk material analysis. Additionally, surface morphology and subsurface analysis can be evaluated utilizing AUGER-ESCA and Microprobe testing. The result is that compositional integrity, as well as consistency, and homogeneity are maintained for each target or evaporation source.

Material Development
Through our technological development, all phases of material characterization can be accomplished. The properties of a metal or compound can be accurately determined through the use of qualitative and quantitative analytical techniques. This approach is especially helpful in developing new materials for specific applications or refining current materials to meet tighter quality requirements.

Advanced Engineering
Plasmaterials, Inc. has developed a large range of fabrication techniques. Materials can be formed or shaped into unique contours for enhanced designs, rotary targets, and evaporation charges, etc.

Plasma Spraying
Plasmaterials, Inc. has been innovative in developing the technology to plasma spray materials directly onto cooling plates for both planar and rotary sputtering applications.

A new generation of materials can now be supplied which previously had been impossible to fabricate. Nonequilibrium alloys, phase pure composite, amorphous materials and supersaturated solutions can be supplied on the backing plates and tubes to help create the next generation of thin film development.

Quality Control
Plasmaterials, Inc. is committed to providing the highest quality products and services while matching the changing needs and expectations of its customers.

Composition / Product Name / Download MSDS

Ag Silver Download PDF
Al Aluminum Download PDF
Al2O3 Aluminum Oxide, Alumina Download PDF
AlF3 Aluminum Fluoride, Aluminum Trifluoride Download PDF
AlN Aluminum Nitride Download PDF
B Boron Download PDF
B4C Boron Carbide, Tetraboron Carbide, Norbide Download PDF
Ba Barium Download PDF
BaO Barium Oxide Download PDF
BaTiO3 Barium Titanate Download PDF
BeO Beryllium Oxide Download PDF
Bi4TiO3 Bismuth Titanate Download PDF
BN Boron Nitride Download PDF
BP Boron Phosphide Download PDF
Ca Calcium Download PDF
CaF2 Calcium Fluoride Download PDF
CaS Calcium Sulphide Download PDF
CdS Cadmium Sulphide, Cadmium Monosulphide, Greenockite Download PDF
CdSe Cadmium Selenide Download PDF
CdTe Cadmium Telluride, Cadmium Monotelluride Download PDF
Ce Cerium Download PDF
CeF3 Cerium Fluoride, Cerous Fluoride, Cerium Trifluoride Download PDF
CeO2 Cerium Oxide, Cerium Dioxide, Ceric Oxide, Ceria, Cerium III Download PDF
Co Cobalt Download PDF
Cr2N Chromium Nitride Download PDF
Cr2O3 Chromium Oxide Download PDF
Cr Chromium Download PDF
CrSi2 Chromium Silicide Download PDF
CsO2 Cesium Oxide Download PDF
Cu Copper Download PDF
Er Erbium Download PDF
Eu2O3 Europium Oxide Download PDF
Eu Europium Download PDF
Fe Iron Download PDF
Fe2O3 Iron Oxide Download PDF
Ga Gallium Download PDF
Ga2O3 Gallium Oxide Download PDF
Ge Germanium Download PDF
Hf Hafnium Download PDF
HfC Hafnium Carbide Download PDF
HfO2 Hafnium Oxide Download PDF
HfSi2 Hafnium Silicide Download PDF
In Indium Download PDF
In2O3 Indium Oxide Download PDF
In(90)Sn(10) Indium Tin Alloy Download PDF
InSe Indium Selenide Download PDF
Ir Iridium Download PDF
In2O3-SnO2 Indium Tin Oxide (ITO) Download PDF
La Lanthanum Download PDF
LaB6 Lanthanum Hexaboride Download PDF
LaF3 Lanthanum Fluoride Download PDF
Li Lithium Download PDF
LiF Lithium Fluoride Download PDF
LiMn2O4 Lithium Manganese Oxide Download PDF
LiP Lithium Phosphide Download PDF
Mg Magnesium Download PDF
MgF2 Magnesium Fluoride Download PDF
Mn Manganese Download PDF
MnO2 Manganese Oxide Download PDF
Mo Molybdenum Download PDF
MoS2 Molybdenum Sulphide Download PDF
NaF Sodium Fluoride Download PDF
Nb Niobium Download PDF
Nd2O3 Neodymium Oxide Download PDF
Ni Nickel Download PDF
NiCr Nickel Chromium Download PDF
NiO Nickel Oxide Download PDF
Pb Lead Download PDF
PbS Lead Sulphide Download PDF
Pt Platinum Download PDF
Sb Antimony Download PDF
Se Selenium Download PDF
Si Silicon Download PDF
SiC Silicon Carbide, Carbon Silicide, Carorundum, Silundum Download PDF
SiO Silicon Monoxide Download PDF
Si3N4 Silicon Nitride Download PDF
Sm Samarium Download PDF
Sm2O3 Samarium Oxide Download PDF
Sn Tin Download PDF
SnO2 Tin Oxide Download PDF
SnSb Tin Antimony Download PDF
SrF2 Strontium Fluoride Download PDF
SrO Strontium Oxide Download PDF
SrS Strontium Sulfide Download PDF
SrTiO3 Strontium Titanate Download PDF
Ta Tantalum Download PDF
Ta2O5 Tantalum Oxide, Tantalum Pentoxide, Tantalum (V) Oxide Download PDF
Te Tellurium Download PDF
ThO2 Thorium Oxide Download PDF
Ti Titanium Download PDF
TiC Titanium Carbide Download PDF
W Tungsten Download PDF
WC Tungsten Carbide Download PDF
W-Ti Tungsten-Titanium Download PDF
Y Yttrium Download PDF
Yb Ytterbium Download PDF
Zn Zinc Download PDF
ZnO Zinc Oxide Download PDF
Zr Zirconium Download PDF